Nanomagnet fabrication using nanoimprint lithography and electrodeposition

We present a novel fabrication process for the growth of metal nanostructures that combines nanoimprint lithography and electrodeposition, both of which are suitable for large-scale industrial fabrication. Gold nanostructures fabricated by nanoimprint lithography on a highly doped, p-type, Si wafer act as a seed layer for metal electrodeposition. This novel process has wide applications in nanomagnet logic and surface-enhanced electrochemistry. We fabricate magnetic nanowires and nanodots using this process. The resulting nanostructures are analyzed with atomic force microscopy and scanning electron microscopy, the composition of the electrodeposited nanostructures are analyzed by energy-dispersive X-ray spectroscopy, and the magnetic properties are measured with magnetic force microscopy.