Nano-structured micropatterns by combination of block copolymer self-assembly and UV photolithography

B. Gorzolnik, P. Mela, M. Moeller

Research output: Contribution to journalArticlepeer-review

59 Scopus citations


A procedure for the fabrication of nano-structured micropatterns by direct UV photo-patterning of a monolayer of a self-assembled block copolymer/transition metal hybrid structure is described. The method exploits the selective photochemical modification of a self-assembled monolayer of hexagonally ordered block copolymer micelles loaded with a metal precursor salt. Solvent development of the monolayer after irradiation results in the desired pattern of micelles on the surface. Subsequent plasma treatment of the pattern leaves ordered metal nanodots. The presented technique is a simple and low-cost combination of 'top-down' and 'bottom-up' approaches that allows decoration of large areas with periodic and aperiodic patterns of nano-objects, with good control over two different length scales: nano-and micrometres.

Original languageEnglish
Article number042
Pages (from-to)5027-5032
Number of pages6
Issue number19
StatePublished - 14 Oct 2006
Externally publishedYes


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