Skip to main navigation Skip to search Skip to main content

Modeling of statistical low-frequency noise of deep-submicrometer MOSFETs

  • Gilson I. Wirth
  • , Jeongwook Koh
  • , Roberto da Silva
  • , Roland Thewes
  • , Ralf Brederlow
  • UFRGS
  • State University of Rio Grande do Sul (UERGS)
  • Infineon Technologies AG
  • Samsung Electronics Co. Ltd.

Research output: Contribution to journalArticlepeer-review

81 Scopus citations

Abstract

The low-frequency noise (LF-noise) of deep-submicrometer MOSFETs is experimentally studied with special emphasis on yield relevant parameter scattering. A novel modeling approach is developed which includes detailed consideration of statistical effects. The model is based on device physics parameters which cause statistical variations in LF-noise behavior of individual devices. Discrete quantities are used and analytical results for the statistical parameters are derived. Analytical equations for average value and standard deviation of noise power are provided. The model is compatible with standard compact models used for circuit simulation.

Original languageEnglish
Pages (from-to)1576-1588
Number of pages13
JournalIEEE Transactions on Electron Devices
Volume52
Issue number7
DOIs
StatePublished - Jul 2005
Externally publishedYes

Keywords

  • Analog circuits
  • Low-frequency noise (LF-noise)
  • MOS transistors
  • Noise modeling
  • RF circuits
  • Semiconductor device noise

Fingerprint

Dive into the research topics of 'Modeling of statistical low-frequency noise of deep-submicrometer MOSFETs'. Together they form a unique fingerprint.

Cite this