Model of Substrate Capacitance of MOSFET RF Switch Inspired by Inverted Microstrip Line

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

8 Scopus citations

Abstract

The subject of the paper is substrate capacitance modeling for MOSFET-based RF switches on high-ohmic silicon substrates. Microstrip line computational models are applied for calculating the capacitance. It is proposed to use inverted microstrip line model for the flip-chip IC mounting configuration. The model-to-hardware correlation has been demonstrated on a prototype switch IC fabricated in a dedicated 130 nm bulk-CMOS technology. The calculated switch RF breakdown voltages (serving as an indicator for the substrate capacitance) of 56 V and 54.8 V was measured to be 55.4 V and 51.4 V for the wire-bonded and flip-chip ICs respectively.

Original languageEnglish
Title of host publicationESSDERC 2021 - IEEE 51st European Solid-State Device Research Conference, Proceedings
PublisherEditions Frontieres
Pages207-210
Number of pages4
ISBN (Electronic)9781665437479
DOIs
StatePublished - 2021
Externally publishedYes
Event51st IEEE European Solid-State Device Research Conference, ESSDERC 2021 - Virtual, Online, France
Duration: 6 Sep 20219 Sep 2021

Publication series

NameEuropean Solid-State Device Research Conference
Volume2021-September
ISSN (Print)1930-8876

Conference

Conference51st IEEE European Solid-State Device Research Conference, ESSDERC 2021
Country/TerritoryFrance
CityVirtual, Online
Period6/09/219/09/21

Keywords

  • Antenna tuning
  • CMOS switch
  • RF front-end
  • flip-chip mounting
  • high-voltage RF switch
  • wire-bonding

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