Mixed hydrazido amido/imido complexes of tantalum, hafnium and zirconium: Potential precursors for metal nitride MOCVD

Keyphrases

• Zirconia 100%
• Amido 100%
• Hafnium 100%
• Tantalum 100%
• Metal-organic Chemical Vapor Deposition (MOCVD) 100%
• Imido Complexes 100%
• Metal Nitrides 100%
• Dimethylhydrazine 100%
• Amines 50%
• Coordination Compounds 50%
• 13C NMR 50%
• Trimethylsilyl 50%
• Nme2 50%
• Mixed Ligands 50%
• Coordination Chemistry 50%
• Thermal Behavior 50%
• Li Salts 50%
• Mass Spectrometry 50%
• Hydrazine 50%
• Si Film 50%
• Tetrachloride 50%
• Hydrazine Derivatives 50%
• TiAlN 50%
• Hydrazide Ligands 50%
• New Complexes 50%
• Salt Metathesis 50%

Chemistry

• Zirconium 100%
• Hafnium 100%
• Tantalum 100%
• Metallorganic Chemical Vapor Deposition 100%
• Nitride 100%
• Histamine 100%
• Scanning Electron Microscopy 50%
• 13C NMR Spectroscopy 50%
• Crystal Structure 50%
• Coordination Chemistry 50%
• Mass Spectrometry 50%
• Rutherford Backscattering Spectroscopy 50%
• Table Salt 50%