Millimetre-wave generation with semiconductor superlattice mounted in cavity fabricated by UV-photolithography and galvanoforming

M. Haeussler; E. Schomburg; J. M. Batke; F. Klappenberger; A. Weber; H. Appel; K. F. Renk; H. Hummel; B. Stroebl; D. G. Pavel'ev; Yu Koschurinov

doi:10.1049/el:20030523

Millimetre-wave generation with semiconductor superlattice mounted in cavity fabricated by UV-photolithography and galvanoforming

M. Haeussler, E. Schomburg, J. M. Batke, F. Klappenberger, A. Weber, H. Appel, K. F. Renk, H. Hummel, B. Stroebl, D. G. Pavel'ev, Yu Koschurinov

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

A fabrication technique for a waveguide cavity with submillimetre dimensions is reported. The cavity was composed of galvanoformed nickel structures. A mould for the galvanoforming was made from a thick-film UV-photoresist. Using a semiconductor superlattice as active element, generation of millimetre-waves (170 GHz) was observed, but with subharmonics owing to yet insufficient suppression of bias oscillations. The microstructuring technique may be suitable for the development of solid-state radiation sources up to THz frequencies.

Original language	English
Pages (from-to)	784-785
Number of pages	2
Journal	Electronics Letters
Volume	39
Issue number	10
DOIs	https://doi.org/10.1049/el:20030523
State	Published - 15 May 2003
Externally published	Yes

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Haeussler, M., Schomburg, E., Batke, J. M., Klappenberger, F., Weber, A., Appel, H., Renk, K. F., Hummel, H., Stroebl, B., Pavel'ev, D. G., & Koschurinov, Y. (2003). Millimetre-wave generation with semiconductor superlattice mounted in cavity fabricated by UV-photolithography and galvanoforming. Electronics Letters, 39(10), 784-785. https://doi.org/10.1049/el:20030523

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abstract = "A fabrication technique for a waveguide cavity with submillimetre dimensions is reported. The cavity was composed of galvanoformed nickel structures. A mould for the galvanoforming was made from a thick-film UV-photoresist. Using a semiconductor superlattice as active element, generation of millimetre-waves (170 GHz) was observed, but with subharmonics owing to yet insufficient suppression of bias oscillations. The microstructuring technique may be suitable for the development of solid-state radiation sources up to THz frequencies.",

author = "M. Haeussler and E. Schomburg and Batke, {J. M.} and F. Klappenberger and A. Weber and H. Appel and Renk, {K. F.} and H. Hummel and B. Stroebl and Pavel'ev, {D. G.} and Yu Koschurinov",

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doi = "10.1049/el:20030523",

language = "English",

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AU - Haeussler, M.

AU - Schomburg, E.

AU - Batke, J. M.

AU - Klappenberger, F.

AU - Weber, A.

AU - Appel, H.

AU - Renk, K. F.

AU - Hummel, H.

AU - Stroebl, B.

AU - Pavel'ev, D. G.

AU - Koschurinov, Yu

PY - 2003/5/15

Y1 - 2003/5/15

N2 - A fabrication technique for a waveguide cavity with submillimetre dimensions is reported. The cavity was composed of galvanoformed nickel structures. A mould for the galvanoforming was made from a thick-film UV-photoresist. Using a semiconductor superlattice as active element, generation of millimetre-waves (170 GHz) was observed, but with subharmonics owing to yet insufficient suppression of bias oscillations. The microstructuring technique may be suitable for the development of solid-state radiation sources up to THz frequencies.

AB - A fabrication technique for a waveguide cavity with submillimetre dimensions is reported. The cavity was composed of galvanoformed nickel structures. A mould for the galvanoforming was made from a thick-film UV-photoresist. Using a semiconductor superlattice as active element, generation of millimetre-waves (170 GHz) was observed, but with subharmonics owing to yet insufficient suppression of bias oscillations. The microstructuring technique may be suitable for the development of solid-state radiation sources up to THz frequencies.

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VL - 39

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JO - Electronics Letters

JF - Electronics Letters

IS - 10

ER -

Millimetre-wave generation with semiconductor superlattice mounted in cavity fabricated by UV-photolithography and galvanoforming

Abstract

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