Abstract
Short-period Si/Ge superlattices have special symmetry properties due to the tetrahedral bonding. In [001]-oriented throughout (Si)m/(Ge)n (m:n) superlattices (m monolayers Si,n monolayers Ge) the primitive unit cell is determined by a multiple of two monolayers. Thus, for m+n odd the periodicity is doubled to 2(m+n) monolayers. Low-temperature molecular-beam epitaxy is used to realize atomically sharp Si/Ge superlattices. The symmetry properties have been studied by selected area diffraction with the transmission electron microscope and by Raman spectroscopy. Clear evidence is observed for the ten-monolayer periodicity in a (Si)2/(Ge)3 superlattice.
| Original language | English |
|---|---|
| Pages (from-to) | 5188-5191 |
| Number of pages | 4 |
| Journal | Physical Review B |
| Volume | 43 |
| Issue number | 6 |
| DOIs | |
| State | Published - 1991 |