@inproceedings{417d149445b34c2b888fd9e14cc7e9c3,
title = "Mechatronic system design of an optical element curvature actuation system",
abstract = "In the market of Integrated Circuit (IC) manufacturing, photolithography is seen as the crucial and enabling step in achieving smaller feature size. To realize these features, photolithography equipment with tighter focus budgets are required [1]. Main contributor to the budget is wafer unflatness [2]. This study proposes a way to reduce focus budget dependency on wafer unflatness by a curvature correction mechanism which is achieved by actively controlling optical element curvature with a piezoelectric actuation system.",
author = "Valentin, {C. L.} and {Van Wuijckhuijse}, {J. B.} and Vermeulen, {J. B.} and {Van Bree}, {B. C.T.} and Rixen, {D. J.} and {Munnig Schmidt}, {R. H.}",
year = "2010",
language = "English",
series = "Proceedings of the 10th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2010",
publisher = "euspen",
pages = "437--440",
editor = "{Van Brussel}, H. and Henny Spaan and P. Shore and Theresa Burke",
booktitle = "Proceedings of the 10th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2010",
note = "10th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2010 ; Conference date: 31-05-2010 Through 04-06-2010",
}