MBE growth of ternary SnGeSiGe superlattices

W. Dondl, E. Silveira, G. Abstreiter

Research output: Contribution to journalArticlepeer-review

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Abstract

Short period α-Sn/Ge/Si/Ge superlattices have been prepared on (001) Ge substrates by a low temperature molecular beam epitaxy (MBE) technique that allows large substrate temperature variations. LEED patterns show a good crystalline quality. Folded acoustic phonons of the superlattice structure are clearly visible in Raman spectroscopy. Their energetic positions are in good agreement with theoretical expectations.

Original languageEnglish
Pages (from-to)400-404
Number of pages5
JournalJournal of Crystal Growth
Volume157
Issue number1-4
DOIs
StatePublished - 2 Dec 1995

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