MBE growth of metamorphic In(Ga)AlAs buffers

M. Sexl, G. Bohm, M. Maier, G. Trankle, G. Weimann, G. Abstreiter

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

Metamorphic buffer layers were grown by MBE on GaAs-substrates using linearly graded InAlAs and InGaAlAs buffers to accommodate lattice misfit. The surface morphology was investigated by AFM, the relaxation behavior of the metamorphic buffers are studied by high resolution X-ray diffraction. The degree of relaxation is 86% for the ternary buffer and 90% for the quarternary buffer. Increasing the final In-composition of the buffer up to a value of 0.63, the In0.52Al0.48As/In0.53Ga0.47As layers on top of the metamorphic buffer are unstrained. Transport properties of 2DEG-structures approach those of lattice matched reference samples on InP-substrates.

Original languageEnglish
Title of host publicationProceedings of the IEEE 24th International Symposium on Compound Semiconductors, ISCS 1997
EditorsMike Melloch, Mark A. Reed
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages49-52
Number of pages4
ISBN (Print)0780338839, 9780780338838
DOIs
StatePublished - 1997
Event24th IEEE International Symposium on Compound Semiconductors, ISCS 1997 - San Diego, United States
Duration: 8 Sep 199711 Sep 1997

Publication series

NameProceedings of the IEEE 24th International Symposium on Compound Semiconductors, ISCS 1997

Conference

Conference24th IEEE International Symposium on Compound Semiconductors, ISCS 1997
Country/TerritoryUnited States
CitySan Diego
Period8/09/9711/09/97

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