Abstract
The structural, electronic, optical, and electrical properties of amorphous silicon suboxides with oxygen concentrations between 0 and 44 were investigated with respect to light-induced metastability. Light-soaking experiments were performed by illuminating the a-SiOx:H samples by above-band gap light for prolonged times at high intensities. It was found that metastable degradation proceeds more slowly in a-SiOx:H, due to a higher concentration of stable defects caused by oxygen backbonding. A redshift of the absorption edge, which was irreversible for annealing below T≤300°C, was observed for multiple degradation cycles.
Original language | English |
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Pages (from-to) | 4046-4059 |
Number of pages | 14 |
Journal | Journal of Applied Physics |
Volume | 95 |
Issue number | 8 |
DOIs | |
State | Published - 15 Apr 2004 |