Abstract
Self-assembled Ge islands are weakly ordered along the intrinsic step direction when grown directly on well-prepared biatomic-stepped vicinal Si(001) surfaces. Prominent two-dimensional ordering of Ge islands is realized when a SiGe/Si multilayer is predeposited on such vicinal Si(001) surfaces and step-bunching takes place. The ordering helps to narrow the size distribution of the Ge islands. This provides an effective method for controlling the Ge islands in both ordering and size.
Original language | English |
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Pages (from-to) | 252-255 |
Number of pages | 4 |
Journal | Thin Solid Films |
Volume | 336 |
Issue number | 1-2 |
DOIs | |
State | Published - 30 Dec 1998 |
Keywords
- Atomic force microscopy
- Ge island
- Molecular beam epitaxy
- Self-ordering
- Step-bunching
- Vicinal surface