Laser-interference crystallization of amorphous silicon: Applications and properties

C. E. Nebel, S. Christiansen, H. P. Strunk, B. Dahlheimer, U. Karrer, M. Stutzmann

Research output: Contribution to journalArticlepeer-review

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Abstract

The generation of two-dimensional seed arrays with periods in the range 0.5 to 10 μm in a-Si layers of 100 to 400 nm thickness on glass, using three interfering beams from a pulsed Nd: YAG laser is described. The size of the seeds depends on the applied laser intensity and varies between 100 and 1000 nm. The seeds consist of small nc-Si grains of 30 to 50 nm diameter which govern the subsequent thermal or laser-stimulated growth of large crystallites. The seeded growth phenomena and the related structural properties of the μc-Si layers measured by transmission electron, scanning electron, and atomic force microscopy are discussed.

Original languageEnglish
Pages (from-to)667-674
Number of pages8
JournalPhysica Status Solidi (A) Applied Research
Volume166
Issue number2
DOIs
StatePublished - Apr 1998

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