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Large-scale phase-field simulation of three-dimensional isotropic grain growth in polycrystalline thin films

  • Eisuke Miyoshi
  • , Tomohiro Takaki
  • , Munekazu Ohno
  • , Yasushi Shibuta
  • , Shinji Sakane
  • , Takayuki Aoki
  • Kyoto Institute of Technology
  • Hokkaido University
  • University of Tokyo
  • Tokyo Institute of Technology

Research output: Contribution to journalArticlepeer-review

20 Scopus citations

Abstract

In this study, assuming an ideal system free from thermal grooving and anisotropy in grain boundary properties, we analyze thin-film grain growth via three-dimensional (3D) phase-field simulations with approximately one million initial grains. The large-scale simulations accelerated by multiple graphics processing units allow for the reliable statistical investigation of grain growth behaviors in films with various thickness. Over the transition from 3D to two-dimensional (2D) growth modes, variations in the averages and distributions of grain sizes are quantified and compared for different regions of the films. Furthermore, we propose a comprehensive scaling law of thin-film grain growth, by which the 3D-2D transition behaviors and grain growth kinetics can be described in a unified manner independent of film thickness.

Original languageEnglish
Article number054003
JournalModelling and Simulation in Materials Science and Engineering
Volume27
Issue number5
DOIs
StatePublished - 16 May 2019
Externally publishedYes

Keywords

  • grain growth
  • largescale simulation
  • microstructure
  • phase-field method
  • thin film

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