Kinetic Monte Carlo of transport processes in Al/AlOx/Au-layers: Impact of defects

Benedikt Weiler; Tobias Haeberle; Alessio Gagliardi; Paolo Lugli

doi:10.1063/1.4963180

Kinetic Monte Carlo of transport processes in Al/AlO_x/Au-layers: Impact of defects

Benedikt Weiler
, Tobias Haeberle
, Alessio Gagliardi
, Paolo Lugli

Associate Professorship of Simulation of Nanosystems for Energy Conversion

Technical University of Munich

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

Ultrathin films of alumina were investigated by a compact kMC-model. Experimental jV-curves from Al/AlO_x/Au-junctions with plasma- and thermal-grown AlO_x were fitted by simulated ones. We found dominant defects at 2.3-2.5 eV below CBM for AlO_x with an effective mass m_ox∗ =0.35 m₀ and a barrier EB,Al/AlOx≈2.8 eV in agreement with literature. The parameterization is extended to varying defect levels, defect densities, injection barriers, effective masses and the thickness of AlO_x. Thus, dominant charge transport processes and implications on the relevance of defects are derived and AlO_x parameters are specified which are detrimental for the operation of devices.

Original language	English
Article number	095112
Journal	AIP Advances
Volume	6
Issue number	9
DOIs	https://doi.org/10.1063/1.4963180
State	Published - 1 Sep 2016

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title = "Kinetic Monte Carlo of transport processes in Al/AlOx/Au-layers: Impact of defects",

abstract = "Ultrathin films of alumina were investigated by a compact kMC-model. Experimental jV-curves from Al/AlOx/Au-junctions with plasma- and thermal-grown AlOx were fitted by simulated ones. We found dominant defects at 2.3-2.5 eV below CBM for AlOx with an effective mass mox∗ =0.35 m0 and a barrier EB,Al/AlOx≈2.8 eV in agreement with literature. The parameterization is extended to varying defect levels, defect densities, injection barriers, effective masses and the thickness of AlOx. Thus, dominant charge transport processes and implications on the relevance of defects are derived and AlOx parameters are specified which are detrimental for the operation of devices.",

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AU - Weiler, Benedikt

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AU - Lugli, Paolo

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AB - Ultrathin films of alumina were investigated by a compact kMC-model. Experimental jV-curves from Al/AlOx/Au-junctions with plasma- and thermal-grown AlOx were fitted by simulated ones. We found dominant defects at 2.3-2.5 eV below CBM for AlOx with an effective mass mox∗ =0.35 m0 and a barrier EB,Al/AlOx≈2.8 eV in agreement with literature. The parameterization is extended to varying defect levels, defect densities, injection barriers, effective masses and the thickness of AlOx. Thus, dominant charge transport processes and implications on the relevance of defects are derived and AlOx parameters are specified which are detrimental for the operation of devices.

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JO - AIP Advances

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ER -

Kinetic Monte Carlo of transport processes in Al/AlO_x/Au-layers: Impact of defects

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