Kapitza phonon transmission from clean H‐silicon(111) surfaces into liquid helium

K. H. Wichert; C. Reimann; G. Blahusch; H. Kinder

doi:10.1002/andp.19955070303

Kapitza phonon transmission from clean H‐silicon(111) surfaces into liquid helium

K. H. Wichert, C. Reimann, G. Blahusch, H. Kinder

Department of Physics

Technical University of Munich

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

We have studied the phonon transmission from ultraclean Si(111) surfaces into liquid helium by the phonon pulse technique. Reflection experiments and angular resolving transmission experiments were performed to measure the absolute value of the transmission coefficient and its dependence on the phonon emission angle into the solid. Clean samples etched conventionally in dilute HF show a significant anomalous transmission. An additional etch step in highly buffered HF (i.e., NH₄F) with a pH‐value of 7.8 reduces the transmission coefficient drastically. Local inhomogeneities of the transmission coefficient caused by the deposition of water molecules on the surface could be visualized by the enhanced transmission. We found that the observed anomalous transmission is caused by mass defects.

Original language	English
Pages (from-to)	175-183
Number of pages	9
Journal	Annalen der Physik
Volume	507
Issue number	3
DOIs	https://doi.org/10.1002/andp.19955070303
State	Published - 1995

Keywords

Kapitza resistance
Phonons
Silicon(111)

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10.1002/andp.19955070303

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title = "Kapitza phonon transmission from clean H‐silicon(111) surfaces into liquid helium",

abstract = "We have studied the phonon transmission from ultraclean Si(111) surfaces into liquid helium by the phonon pulse technique. Reflection experiments and angular resolving transmission experiments were performed to measure the absolute value of the transmission coefficient and its dependence on the phonon emission angle into the solid. Clean samples etched conventionally in dilute HF show a significant anomalous transmission. An additional etch step in highly buffered HF (i.e., NH4F) with a pH‐value of 7.8 reduces the transmission coefficient drastically. Local inhomogeneities of the transmission coefficient caused by the deposition of water molecules on the surface could be visualized by the enhanced transmission. We found that the observed anomalous transmission is caused by mass defects.",

keywords = "Kapitza resistance, Phonons, Silicon(111)",

author = "Wichert, {K. H.} and C. Reimann and G. Blahusch and H. Kinder",

year = "1995",

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language = "English",

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journal = "Annalen der Physik",

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T1 - Kapitza phonon transmission from clean H‐silicon(111) surfaces into liquid helium

AU - Wichert, K. H.

AU - Reimann, C.

AU - Blahusch, G.

AU - Kinder, H.

PY - 1995

Y1 - 1995

N2 - We have studied the phonon transmission from ultraclean Si(111) surfaces into liquid helium by the phonon pulse technique. Reflection experiments and angular resolving transmission experiments were performed to measure the absolute value of the transmission coefficient and its dependence on the phonon emission angle into the solid. Clean samples etched conventionally in dilute HF show a significant anomalous transmission. An additional etch step in highly buffered HF (i.e., NH4F) with a pH‐value of 7.8 reduces the transmission coefficient drastically. Local inhomogeneities of the transmission coefficient caused by the deposition of water molecules on the surface could be visualized by the enhanced transmission. We found that the observed anomalous transmission is caused by mass defects.

AB - We have studied the phonon transmission from ultraclean Si(111) surfaces into liquid helium by the phonon pulse technique. Reflection experiments and angular resolving transmission experiments were performed to measure the absolute value of the transmission coefficient and its dependence on the phonon emission angle into the solid. Clean samples etched conventionally in dilute HF show a significant anomalous transmission. An additional etch step in highly buffered HF (i.e., NH4F) with a pH‐value of 7.8 reduces the transmission coefficient drastically. Local inhomogeneities of the transmission coefficient caused by the deposition of water molecules on the surface could be visualized by the enhanced transmission. We found that the observed anomalous transmission is caused by mass defects.

KW - Kapitza resistance

KW - Phonons

KW - Silicon(111)

UR - http://www.scopus.com/inward/record.url?scp=84990158073&partnerID=8YFLogxK

U2 - 10.1002/andp.19955070303

DO - 10.1002/andp.19955070303

M3 - Article

AN - SCOPUS:84990158073

SN - 0003-3804

VL - 507

SP - 175

EP - 183

JO - Annalen der Physik

JF - Annalen der Physik

IS - 3

ER -

Kapitza phonon transmission from clean H‐silicon(111) surfaces into liquid helium

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Keywords

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