Investigations of a high volume atmospheric plasma torch at 915MHz

J. Kopecki; D. Kiesler; M. Leins; A. Schulz; M. Walker; M. Kaiser; H. Muegge; U. Stroth

doi:10.1016/j.surfcoat.2011.04.031

Investigations of a high volume atmospheric plasma torch at 915MHz

J. Kopecki, D. Kiesler, M. Leins, A. Schulz, M. Walker, M. Kaiser, H. Muegge, U. Stroth

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

An atmospheric pressure microwave plasma torch at a frequency of 915. MHz was developed and investigated. The development was accompanied by simulations of the electromagnetic field distribution in the plasma device with the programme CST Microwave Studio®. Optical emission spectroscopy (OES) was carried out in order to determine the gas temperature of the plasma. The measured temperature of an argon/hydrogen-plasma was up to 7000. K which is high enough to evaporate all materials. As an application we used the plasma torch for reactive evaporation of silicon powder and subsequent deposition of silicon coatings with different morphologies which were investigated mainly by scanning electron microscopy.

Original language	English
Pages (from-to)	S342-S346
Journal	Surface and Coatings Technology
Volume	205
Issue number	SUPPL. 2
DOIs	https://doi.org/10.1016/j.surfcoat.2011.04.031
State	Published - 25 Jul 2011
Externally published	Yes

Keywords

Atmospheric plasma torch
Microwave
Optical emission spectroscopy
Plasma spraying
Silicon

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10.1016/j.surfcoat.2011.04.031

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title = "Investigations of a high volume atmospheric plasma torch at 915MHz",

abstract = "An atmospheric pressure microwave plasma torch at a frequency of 915. MHz was developed and investigated. The development was accompanied by simulations of the electromagnetic field distribution in the plasma device with the programme CST Microwave Studio{\textregistered}. Optical emission spectroscopy (OES) was carried out in order to determine the gas temperature of the plasma. The measured temperature of an argon/hydrogen-plasma was up to 7000. K which is high enough to evaporate all materials. As an application we used the plasma torch for reactive evaporation of silicon powder and subsequent deposition of silicon coatings with different morphologies which were investigated mainly by scanning electron microscopy.",

keywords = "Atmospheric plasma torch, Microwave, Optical emission spectroscopy, Plasma spraying, Silicon",

author = "J. Kopecki and D. Kiesler and M. Leins and A. Schulz and M. Walker and M. Kaiser and H. Muegge and U. Stroth",

note = "Funding Information: This work was partly funded by the Landesstiftung Baden-W{\"u}rttemberg gGmbH within the framework of the “PlasSol” project .",

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T1 - Investigations of a high volume atmospheric plasma torch at 915MHz

AU - Kopecki, J.

AU - Kiesler, D.

AU - Leins, M.

AU - Schulz, A.

AU - Walker, M.

AU - Kaiser, M.

AU - Muegge, H.

AU - Stroth, U.

N1 - Funding Information: This work was partly funded by the Landesstiftung Baden-Württemberg gGmbH within the framework of the “PlasSol” project .

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Y1 - 2011/7/25

N2 - An atmospheric pressure microwave plasma torch at a frequency of 915. MHz was developed and investigated. The development was accompanied by simulations of the electromagnetic field distribution in the plasma device with the programme CST Microwave Studio®. Optical emission spectroscopy (OES) was carried out in order to determine the gas temperature of the plasma. The measured temperature of an argon/hydrogen-plasma was up to 7000. K which is high enough to evaporate all materials. As an application we used the plasma torch for reactive evaporation of silicon powder and subsequent deposition of silicon coatings with different morphologies which were investigated mainly by scanning electron microscopy.

AB - An atmospheric pressure microwave plasma torch at a frequency of 915. MHz was developed and investigated. The development was accompanied by simulations of the electromagnetic field distribution in the plasma device with the programme CST Microwave Studio®. Optical emission spectroscopy (OES) was carried out in order to determine the gas temperature of the plasma. The measured temperature of an argon/hydrogen-plasma was up to 7000. K which is high enough to evaporate all materials. As an application we used the plasma torch for reactive evaporation of silicon powder and subsequent deposition of silicon coatings with different morphologies which were investigated mainly by scanning electron microscopy.

KW - Atmospheric plasma torch

KW - Microwave

KW - Optical emission spectroscopy

KW - Plasma spraying

KW - Silicon

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VL - 205

SP - S342-S346

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - SUPPL. 2

ER -

Investigations of a high volume atmospheric plasma torch at 915MHz

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Keywords

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