Investigation of the thermal noise of MOS transistors under analog and RF operating conditions

Ralf Brederlow, Georg Wenig, Roland Thewes

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

8 Scopus citations

Abstract

We investigate the thermal noise behavior of modern MOS transistors under analog and RF operating conditions. Compared to the noise model used for circuit simulation the measured noise is higher for large gate and drain voltages. This phenomenon is explained by using a new formulation of the classical noise theory which is appropriate for modern short channel devices.

Original languageEnglish
Title of host publicationEuropean Solid-State Device Research Conference
EditorsElena Gnani, Giorgio Baccarani, Massimo Rudan
PublisherIEEE Computer Society
Pages87-90
Number of pages4
ISBN (Electronic)8890084782
DOIs
StatePublished - 2002
Externally publishedYes
Event32nd European Solid-State Device Research Conference, ESSDERC 2002 - Firenze, Italy
Duration: 24 Sep 200226 Sep 2002

Publication series

NameEuropean Solid-State Device Research Conference
ISSN (Print)1930-8876

Conference

Conference32nd European Solid-State Device Research Conference, ESSDERC 2002
Country/TerritoryItaly
CityFirenze
Period24/09/0226/09/02

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