Influence of transistor degradation on CMOS performance and impact on life time criterion

J. Winnerl, A. Lill, D. Schmitt-Landsiedel, M. Orlowski, F. Neppl

Research output: Contribution to journalConference articlepeer-review

4 Scopus citations

Abstract

For more realistic lifetime predictions of CMOS technology a stress test was developed that yields the relevant transistor degradation under dynamic stress and simultaneously the impact of transistor degradation on circuit speed performance. Thus uncertainties with respect to duty factor estimations and special dynamic effects are eliminated. The influence on circuit performance can be directly characterized by the change of ring oscillator frequency. The relative frequency change was found to be about one order of magnitude similar than the transconductance change. Based on these results, a less restrictive lifetime criterion is introduced. If 1-2% frequency change is allowed the acceptable Δgm/gm (where gm is the extrinsic transconductance) can be increased from the typical value of 10% to 25%, resulting in an considerably increased lifetime. For a given lifetime this can be utilized to reduce the gate length from 1 μm to 0.4 μm without reducing the supply voltage, extending the use of 5-V supply voltage into the deep sub-μm regime.

Original languageEnglish
Pages (from-to)204-207
Number of pages4
JournalTechnical Digest - International Electron Devices Meeting
StatePublished - Dec 1988
Externally publishedYes
EventTechnical Digest - International Electron Devices Meeting 1988 - San Francisco, CA, USA
Duration: 11 Dec 198814 Dec 1988

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