In Vacuo Porphyrin Metalation on Ag(111) via Chemical Vapor Deposition of Ru3(CO)12: Mechanistic Insights

Anthoula C. Papageorgiou, Katharina Diller, Sybille Fischer, Francesco Allegretti, Florian Klappenberger, Seung Cheol Oh, Özge Saǧlam, Joachim Reichert, Alissa Wiengarten, Knud Seufert, Willi Auwärter, Johannes V. Barth

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

Abstract

Porphyrin molecules offer a very stable molecular environment for the incorporation of numerous metal ions inside their cavity, which enables a plethora of applications. The fabrication and characterization of surface confined metal-organic architectures by employing porphyrins are of particular interest. Here, we report on a comprehensive study of chemical vapor deposition (CVD) of triruthenium dodecacarbonyl as metal precursor for the on-surface metalation of different porphyrin species with Ru under ultrahigh vacuum conditions. By employing synchrotron radiation X-ray photoelectron spectroscopy (XPS), near-edge X-ray absorption fine structure (NEXAFS), and scanning tunneling microscopy (STM), we investigated the metalation process and particularly the role of the support: the close packed Ag(111) surface. It was found that the surface is active in the metalation process under the employed conditions: it decomposes the metal precursor and delivers metal centers to the porphyrin macrocycles. The generality of the metalation process is illustrated for tetraphenylporphyrin, its high temperature derivatives, and porphine.

Original languageEnglish
Pages (from-to)8751-8758
Number of pages8
JournalJournal of Physical Chemistry C
Volume120
Issue number16
DOIs
StatePublished - 28 Apr 2016

Fingerprint

Dive into the research topics of 'In Vacuo Porphyrin Metalation on Ag(111) via Chemical Vapor Deposition of Ru3(CO)12: Mechanistic Insights'. Together they form a unique fingerprint.

Cite this