Impact of Self-Heating on Negative-Capacitance FinFET: Device-Circuit Interaction

In this work, we analyze the impact of self-heating effects (SHEs) on 14-nm negative capacitance (NC)-FinFET performance from device to the circuit level. The 3-D thermal TCAD simulations, after careful calibration with measurements, are performed to analyze the impact of SHE in a broad range of frequency. Furthermore, we use the TCAD calibrated BSIM-CMG model to analyze the impact of SHE in NC-FinFET at the circuit level, after including a physics-based model to capture the NC effect. For the first time, we analyze the impact of a nonuniform distribution of temperature dissipated from the channel region to gate-stack in NC-FinFETs. On account of the thermal insulating properties of the gate-stack, the ferroelectric (FE) layer is found to be cooler than the channel region under the impact of SHE. We demonstrate that neglecting that and, hence, using the channel temperature to evaluate the temperature-dependent parameter alpha (in the Landau-Khalatanikov model of NC effect) of the FE layer result in a significant overestimation of SHE-induced degradations, such as in the NC voltage gain. Based on our TCAD analysis, we propose a relation between gate-stack temperature and the channel temperature and use this to accurately model the alpha parameter and, hence, SHE in NC-FinFETs. The SHE is found to dominate for both FinFET and NC-FinFET in the gigahertz range, which eventually degrades the performance at the circuit level, which is further confirmed using ring oscillator (RO) simulations.