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Hydrosilylation of crystalline silicon (111) and hydrogenated amorphous silicon surfaces: A comparative x-ray photoelectron spectroscopy study

  • A. Lehner
  • , G. Steinhoff
  • , M. S. Brandt
  • , M. Eickhoff
  • , M. Stutzmann
  • Walter Schottky Institut

Research output: Contribution to journalArticlepeer-review

50 Scopus citations

Abstract

A study was performed on hydrosilylation of crystalline silicon (111) and hydrogenated amorphous silicon surfaces. The x-ray photoelectron spectroscopy was used to analyze the resulting chemical surface structure. It was shown that the results demonstrated successful hydrosilylation on both substrate materials.

Original languageEnglish
Pages (from-to)2289-2294
Number of pages6
JournalJournal of Applied Physics
Volume94
Issue number4
DOIs
StatePublished - 15 Aug 2003

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