Abstract
A study was performed on hydrosilylation of crystalline silicon (111) and hydrogenated amorphous silicon surfaces. The x-ray photoelectron spectroscopy was used to analyze the resulting chemical surface structure. It was shown that the results demonstrated successful hydrosilylation on both substrate materials.
Original language | English |
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Pages (from-to) | 2289-2294 |
Number of pages | 6 |
Journal | Journal of Applied Physics |
Volume | 94 |
Issue number | 4 |
DOIs | |
State | Published - 15 Aug 2003 |