Hydrosilane-Functionalized [2.2]Paracyclophane for Plasma-Etch-Resistant and Post-Modifiable Poly(Para-Xylylene)
Lukas Bichlmaier, Tetsuhiko F. Teshima, Arseni Kostenko, George Al Boustani, Rebecca Wilhelm, Sebastian Stigler, Shuma Tanaka, Hiroaki Onoe, Bernhard Wolfrum, Shigeyoshi Inoue
Research output: Contribution to journal › Article › peer-review
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