High-temperature chlorination-reduction sequence for the preparation of silicon hydride modified silica surfaces

A general method for the functionalization of silica surfaces with silicon hydride (Si-H) groups is described for four different preparations of silica. The silica surface is reduced in a two-step chlorination-reduction procedure within a simple gas-flow system at high temperatures. After initial dehydroxylation of the silica surface, silicon chloride groups are formed by the reaction with thionyl chloride. The chlorination activates otherwise inaccessible surface siloxane moieties. A high silicon-hydride surface concentration results from the subsequent reduction of the chlorinated surface with hydrogen. The physical properties of the resulting silica are analyzed using scanning electron microscopy, as well as dynamic light scattering and Brunauer-Emmet-Teller measurements. The chlorination-reduction sequence has no significant impact on the structure, surface area and mesopore size of the silica materials used. The surface of the materials is characterized by diffuse reflectance infrared Fourier transform (DRIFT) and ²⁹Si CP/MAS NMR spectroscopy. The silicon-hydride groups are mostly of the T_H ³-type. The use of high temperatures (> 800°C) results in the condensation of internal and surface silanol groups. Therefore, materials with both a fully condensed silica matrix as well as a surface free of silanol groups are obtained. The materials are ideal precursors for further molecular silica surface modification, as demonstrated with a ferrocene derivative.