Abstract
The synthesis and characterization of dislocation-free, undoped, single crystals of Si enriched in all three stable isotopes is reported: 28Si (99.92%), 29Si (91.37%), and 30Si (89.8%). A silane-based process compatible with the relatively small amounts of isotopically enriched precursors that are practically available was used. The silane is decomposed to silicon on a graphite starter rod heated to 700-750°C in a recirculating flow reactor. A typical run produces 35 g of polycrystalline Si at a growth rate of 5 μm/min and the silane to Si conversion efficiency exceeds 95%. Single crystals are grown by the float-zone method and characterized by electrical and optical measurements. Concentrations of shallow dopants (P and B) are as low as mid-1013 cm-3. Concentrations of C and O can be lower than 1016 and 1015 cm-3, respectively.
| Original language | English |
|---|---|
| Pages (from-to) | G448-G451 |
| Journal | Journal of the Electrochemical Society |
| Volume | 152 |
| Issue number | 6 |
| DOIs | |
| State | Published - 2005 |
| Externally published | Yes |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 7 Affordable and Clean Energy
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