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Heterogeneously integrated III-V-on-silicon 2.3x μm distributed feedback lasers based on a type-II active region

  • Ruijun Wang
  • , Stephan Sprengel
  • , Aditya Malik
  • , Anton Vasiliev
  • , Gerhard Boehm
  • , Roel Baets
  • , Markus Christian Amann
  • , Gunther Roelkens
  • Ghent University
  • Walter Schottky Institut

Research output: Contribution to journalArticlepeer-review

29 Scopus citations

Abstract

We report on 2.3x μm wavelength InP-based type-II distributed feedback (DFB) lasers heterogeneously integrated on a silicon photonics integrated circuit. In the devices, a III-V epitaxial layer stack with a “W”-shaped InGaAs/GaAsSb multi-quantum-well active region is adhesively bonded to the first-order silicon DFB gratings. Single mode laser emission coupled to a single mode silicon waveguide with a side mode suppression ratio of 40 dB is obtained. In continuous-wave regime, the 2.32 μm laser operates close to room temperature (above 15 °C) and emits more than 1 mW output power with a threshold current density of 1.8 kA/cm2 at 5 °C. A tunable diode laser absorption measurement of CO is demonstrated using this source.

Original languageEnglish
Article number221111
JournalApplied Physics Letters
Volume109
Issue number22
DOIs
StatePublished - 28 Nov 2016

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