From CaSi2 to siloxene: Epitaxial silicide and sheet polymer films on silicon

Günther U. Vogg; Martin S. Brandt; Martin Stutzmann; Martin Albrecht

doi:10.1016/S0022-0248(99)00135-9

From CaSi₂ to siloxene: Epitaxial silicide and sheet polymer films on silicon

Günther U. Vogg, Martin S. Brandt, Martin Stutzmann, Martin Albrecht

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Abstract

The growth of thin epitaxial CaSi₂ films with reactive deposition epitaxy (RDE) on different crystalline silicon surfaces is described. The structure and crystalline quality are studied using transmission and scanning electron microscopy as well as X-ray diffraction. Films on (1 1 1)-Si and (1 1 0)-Si in general consist of a mixture of the tr3 and tr6 modifications of CaSi₂ and show similar crystalline quality. Epitaxial films of siloxene on (1 1 1)-Si are obtained via topochemical transformation of the corresponding CaSi₂ films. X-ray diffraction measurements of siloxene from pure tr6 CaSi₂ show that siloxene is also present in a tr6 modification.

Original language	English
Pages (from-to)	570-581
Number of pages	12
Journal	Journal of Crystal Growth
Volume	203
Issue number	4
DOIs	https://doi.org/10.1016/S0022-0248(99)00135-9
State	Published - Jun 1999

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title = "From CaSi2 to siloxene: Epitaxial silicide and sheet polymer films on silicon",

abstract = "The growth of thin epitaxial CaSi2 films with reactive deposition epitaxy (RDE) on different crystalline silicon surfaces is described. The structure and crystalline quality are studied using transmission and scanning electron microscopy as well as X-ray diffraction. Films on (1 1 1)-Si and (1 1 0)-Si in general consist of a mixture of the tr3 and tr6 modifications of CaSi2 and show similar crystalline quality. Epitaxial films of siloxene on (1 1 1)-Si are obtained via topochemical transformation of the corresponding CaSi2 films. X-ray diffraction measurements of siloxene from pure tr6 CaSi2 show that siloxene is also present in a tr6 modification.",

author = "Vogg, {G{\"u}nther U.} and Brandt, {Martin S.} and Martin Stutzmann and Martin Albrecht",

year = "1999",

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doi = "10.1016/S0022-0248(99)00135-9",

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journal = "Journal of Crystal Growth",

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T1 - From CaSi2 to siloxene

T2 - Epitaxial silicide and sheet polymer films on silicon

AU - Vogg, Günther U.

AU - Brandt, Martin S.

AU - Stutzmann, Martin

AU - Albrecht, Martin

PY - 1999/6

Y1 - 1999/6

N2 - The growth of thin epitaxial CaSi2 films with reactive deposition epitaxy (RDE) on different crystalline silicon surfaces is described. The structure and crystalline quality are studied using transmission and scanning electron microscopy as well as X-ray diffraction. Films on (1 1 1)-Si and (1 1 0)-Si in general consist of a mixture of the tr3 and tr6 modifications of CaSi2 and show similar crystalline quality. Epitaxial films of siloxene on (1 1 1)-Si are obtained via topochemical transformation of the corresponding CaSi2 films. X-ray diffraction measurements of siloxene from pure tr6 CaSi2 show that siloxene is also present in a tr6 modification.

AB - The growth of thin epitaxial CaSi2 films with reactive deposition epitaxy (RDE) on different crystalline silicon surfaces is described. The structure and crystalline quality are studied using transmission and scanning electron microscopy as well as X-ray diffraction. Films on (1 1 1)-Si and (1 1 0)-Si in general consist of a mixture of the tr3 and tr6 modifications of CaSi2 and show similar crystalline quality. Epitaxial films of siloxene on (1 1 1)-Si are obtained via topochemical transformation of the corresponding CaSi2 films. X-ray diffraction measurements of siloxene from pure tr6 CaSi2 show that siloxene is also present in a tr6 modification.

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U2 - 10.1016/S0022-0248(99)00135-9

DO - 10.1016/S0022-0248(99)00135-9

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AN - SCOPUS:0033149092

SN - 0022-0248

VL - 203

SP - 570

EP - 581

JO - Journal of Crystal Growth

JF - Journal of Crystal Growth

IS - 4

ER -

From CaSi₂ to siloxene: Epitaxial silicide and sheet polymer films on silicon

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