First volatile alkylgallyl manganese complexes; structure of [(CO 5)Mn]2Ga[(CH2)3NMe2]. Molecular control of the stoichiometry of Mn-Ga thin films grown by low-pressure MOCVD

Roland A. Fischer; Alexander Miehr; Markus M. Schulte; Eberhardt Herdtweck

doi:10.1039/C39950000337

First volatile alkylgallyl manganese complexes; structure of [(CO ₅)Mn]₂Ga[(CH₂)₃NMe₂]. Molecular control of the stoichiometry of Mn-Ga thin films grown by low-pressure MOCVD

Roland A. Fischer
, Alexander Miehr
, Markus M. Schulte
, Eberhardt Herdtweck

Chair of Inorganic and Organometallic Chemistry

Technical University of Munich

Research output: Contribution to journal › Article › peer-review

18 Scopus citations

Abstract

The Mn-Ga complexes of the general formula {L(CO)₄Mn} _a[GaR_3-a(Do)] (L=CO, R=alkyl; Do=N-Lewis-donor) are obtained in yields ≥90% and used as volatile single source precursors for the gas-phase deposition of thin Mn-Ga alloy films.

Original language	English
Pages (from-to)	337-338
Number of pages	2
Journal	Journal of the Chemical Society, Chemical Communications
Issue number	3
DOIs	https://doi.org/10.1039/C39950000337
State	Published - 1995

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title = "First volatile alkylgallyl manganese complexes; structure of [(CO 5)Mn]2Ga[(CH2)3NMe2]. Molecular control of the stoichiometry of Mn-Ga thin films grown by low-pressure MOCVD",

abstract = "The Mn-Ga complexes of the general formula \{L(CO)4Mn\} a[GaR3-a(Do)] (L=CO, R=alkyl; Do=N-Lewis-donor) are obtained in yields ≥90\% and used as volatile single source precursors for the gas-phase deposition of thin Mn-Ga alloy films.",

author = "Fischer, \{Roland A.\} and Alexander Miehr and Schulte, \{Markus M.\} and Eberhardt Herdtweck",

year = "1995",

doi = "10.1039/C39950000337",

language = "English",

pages = "337--338",

journal = "Journal of the Chemical Society, Chemical Communications",

issn = "0022-4936",

publisher = "Chemical Society",

number = "3",

}

First volatile alkylgallyl manganese complexes; structure of [(CO ₅)Mn]₂Ga[(CH₂)₃NMe₂]. Molecular control of the stoichiometry of Mn-Ga thin films grown by low-pressure MOCVD. / Fischer, Roland A.; Miehr, Alexander; Schulte, Markus M. et al.
In: Journal of the Chemical Society, Chemical Communications, No. 3, 1995, p. 337-338.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - First volatile alkylgallyl manganese complexes; structure of [(CO 5)Mn]2Ga[(CH2)3NMe2]. Molecular control of the stoichiometry of Mn-Ga thin films grown by low-pressure MOCVD

AU - Fischer, Roland A.

AU - Miehr, Alexander

AU - Schulte, Markus M.

AU - Herdtweck, Eberhardt

PY - 1995

Y1 - 1995

N2 - The Mn-Ga complexes of the general formula {L(CO)4Mn} a[GaR3-a(Do)] (L=CO, R=alkyl; Do=N-Lewis-donor) are obtained in yields ≥90% and used as volatile single source precursors for the gas-phase deposition of thin Mn-Ga alloy films.

AB - The Mn-Ga complexes of the general formula {L(CO)4Mn} a[GaR3-a(Do)] (L=CO, R=alkyl; Do=N-Lewis-donor) are obtained in yields ≥90% and used as volatile single source precursors for the gas-phase deposition of thin Mn-Ga alloy films.

UR - https://www.scopus.com/pages/publications/37049067144

U2 - 10.1039/C39950000337

DO - 10.1039/C39950000337

M3 - Article

AN - SCOPUS:37049067144

SN - 0022-4936

SP - 337

EP - 338

JO - Journal of the Chemical Society, Chemical Communications

JF - Journal of the Chemical Society, Chemical Communications

IS - 3

ER -

First volatile alkylgallyl manganese complexes; structure of [(CO ₅)Mn]₂Ga[(CH₂)₃NMe₂]. Molecular control of the stoichiometry of Mn-Ga thin films grown by low-pressure MOCVD

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