Abstract
A method to fabricate gold structures with high aspect ratio is presented. Fresnel zone plates with an outermost zone width of 100 nm and structures of 1 μm height are fabricated. Preliminary focusing results at an X-ray energy of 8 keV are presented and ways to improve the zone plate parameters are discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 1467-1470 |
| Number of pages | 4 |
| Journal | Microelectronic Engineering |
| Volume | 84 |
| Issue number | 5-8 |
| DOIs | |
| State | Published - May 2007 |
| Externally published | Yes |
Keywords
- Electron beam lithography
- Electroplating
- Focusing
- Fresnel zone plate
- Hard X-rays
- X-ray microscopy
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