Electronic Structure, Optoelectronic Properties, and Photoelectrochemical Characteristics of γ-Cu3V2O8 Thin Films

Chang Ming Jiang, Maryam Farmand, Cheng Hao Wu, Yi Sheng Liu, Jinghua Guo, Walter S. Drisdell, Jason K. Cooper, Ian D. Sharp

Research output: Contribution to journalArticlepeer-review

61 Scopus citations

Abstract

Thin films of n-type γ-Cu3V2O8 are prepared with high phase purity via reactive co-sputtering deposition. Complementary X-ray spectroscopic methods are used to reveal that the valence band maximum consists of O 2p states, while the conduction band minimum is primarily composed of Cu 3d states. Therefore, γ-Cu3V2O8 is classified as a charge transfer insulator, in which the 1.80 eV indirect band gap corresponds to the O 2p → Cu 3d transition. Through photoelectrochemical measurements, the surface of γ-Cu3V2O8 photoanodes is found to display intrinsic activity for catalyzing water oxidation that is stable with time. The combination of a small optical band gap, suitable valence band energy, and excellent photoelectrochemical stability suggests that γ-Cu3V2O8 could be a promising photoanode material. However, it is found that the charge extraction efficiency from these semiconductor photoanodes is strongly limited by a short (20-40 nm) hole diffusion length. Characterization of the electronic structure and transport properties of γ-Cu3V2O8 photoanodes suggests strategies for improving energy conversion efficiency and provides fundamental insights that can be used for understanding and evaluating function in a broader class of emerging ternary metal oxides.

Original languageEnglish
Pages (from-to)3334-3345
Number of pages12
JournalChemistry of Materials
Volume29
Issue number7
DOIs
StatePublished - 11 Apr 2017
Externally publishedYes

Fingerprint

Dive into the research topics of 'Electronic Structure, Optoelectronic Properties, and Photoelectrochemical Characteristics of γ-Cu3V2O8 Thin Films'. Together they form a unique fingerprint.

Cite this