Abstract
Electrokinetic pumping of low-volume rates was performed on-chip in channels of small cross sectional area and height in the sub-μm range. The flow was detected with the current monitoring technique by monitoring the change in resistance of the fluid in the channel upon the electroosmosis-driven displacement of an electrolyte solution by a second electrolyte solution. Flow rates in the order of 0.1 pL/s were successfully generated and detected. The channels were fabricated with the sacrificial layer technology.
Original language | English |
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Pages (from-to) | 3687-3693 |
Number of pages | 7 |
Journal | ELECTROPHORESIS |
Volume | 25 |
Issue number | 21-22 |
DOIs | |
State | Published - Nov 2004 |
Externally published | Yes |
Keywords
- Current monitoring technique
- Electroosmotic flow
- Miniaturization
- Nanochannels
- Sacrificial layer technique