Electrical passivation and chemical functionalization of SiC surfaces by chlorine termination

S. J. Schoell; J. Howgate; M. Hoeb; M. Auernhammer; J. A. Garrido; M. Stutzmann; M. S. Brandt; I. D. Sharp

doi:10.1063/1.3587767

Electrical passivation and chemical functionalization of SiC surfaces by chlorine termination

S. J. Schoell, J. Howgate, M. Hoeb, M. Auernhammer, J. A. Garrido, M. Stutzmann, M. S. Brandt, I. D. Sharp

Walter Schottky Institut

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

We have developed a straightforward plasma-based method which yields chlorine-terminated n-type 6H-SiC surfaces. Atomic force microscopy shows that the surface roughness is not affected by the plasma processing. Additionally, x-ray photoelectron spectroscopy reveals a significant reduction in oxygen, and a corresponding rise of chlorine core level intensities, following halogen termination. Contact potential difference and surface photovoltage measurements show formation of negative surface dipoles and approximately flat band surface potentials after chlorine termination of (0001) n-type 6H-SiC (built-in voltage V_bi <20 meV). Starting from halogenated surfaces, we demonstrate both ultraviolet light-induced and thermally-induced functionalization with alkene-derived self-assembled organic monolayers.

Original language	English
Article number	182106
Journal	Applied Physics Letters
Volume	98
Issue number	18
DOIs	https://doi.org/10.1063/1.3587767
State	Published - 2 May 2011

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abstract = "We have developed a straightforward plasma-based method which yields chlorine-terminated n-type 6H-SiC surfaces. Atomic force microscopy shows that the surface roughness is not affected by the plasma processing. Additionally, x-ray photoelectron spectroscopy reveals a significant reduction in oxygen, and a corresponding rise of chlorine core level intensities, following halogen termination. Contact potential difference and surface photovoltage measurements show formation of negative surface dipoles and approximately flat band surface potentials after chlorine termination of (0001) n-type 6H-SiC (built-in voltage Vbi <20 meV). Starting from halogenated surfaces, we demonstrate both ultraviolet light-induced and thermally-induced functionalization with alkene-derived self-assembled organic monolayers.",

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T1 - Electrical passivation and chemical functionalization of SiC surfaces by chlorine termination

AU - Schoell, S. J.

AU - Howgate, J.

AU - Hoeb, M.

AU - Auernhammer, M.

AU - Garrido, J. A.

AU - Stutzmann, M.

AU - Brandt, M. S.

AU - Sharp, I. D.

PY - 2011/5/2

Y1 - 2011/5/2

N2 - We have developed a straightforward plasma-based method which yields chlorine-terminated n-type 6H-SiC surfaces. Atomic force microscopy shows that the surface roughness is not affected by the plasma processing. Additionally, x-ray photoelectron spectroscopy reveals a significant reduction in oxygen, and a corresponding rise of chlorine core level intensities, following halogen termination. Contact potential difference and surface photovoltage measurements show formation of negative surface dipoles and approximately flat band surface potentials after chlorine termination of (0001) n-type 6H-SiC (built-in voltage Vbi <20 meV). Starting from halogenated surfaces, we demonstrate both ultraviolet light-induced and thermally-induced functionalization with alkene-derived self-assembled organic monolayers.

AB - We have developed a straightforward plasma-based method which yields chlorine-terminated n-type 6H-SiC surfaces. Atomic force microscopy shows that the surface roughness is not affected by the plasma processing. Additionally, x-ray photoelectron spectroscopy reveals a significant reduction in oxygen, and a corresponding rise of chlorine core level intensities, following halogen termination. Contact potential difference and surface photovoltage measurements show formation of negative surface dipoles and approximately flat band surface potentials after chlorine termination of (0001) n-type 6H-SiC (built-in voltage Vbi <20 meV). Starting from halogenated surfaces, we demonstrate both ultraviolet light-induced and thermally-induced functionalization with alkene-derived self-assembled organic monolayers.

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Electrical passivation and chemical functionalization of SiC surfaces by chlorine termination

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