Elastic Properties of the Layered Zintl-Phase CaSi2

G. Voog; M. S. Brandt; M. Stutzmann

doi:10.1002/1521-396X(200106)185:2<213::AID-PSSA213>3.0.CO;2-8

Elastic Properties of the Layered Zintl-Phase CaSi₂

G. Voog, M. S. Brandt, M. Stutzmann

TUM Emeriti of Excellence

Walter Schottky Institut

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

The elastic properdes of CaSi₂ are studied by X-ray analysis of strained suicide films grown by reactive deposition epitaxy on Si(111), The diffraction linewidths are found to be mainly determined by heterogeneous strain with negligible size broadening. Homogeneous strain is induced by lattice mismatch for epitaxial films thinner than 50 nm, and is thermally induced for thicker films. The isotropic and anisotropic Poisson ratios of CaSi₂ are determined as v = 0.123(7) and v_c = 0.105(35), respectively.

Original language	English
Pages (from-to)	213-219
Number of pages	7
Journal	Physica Status Solidi (A) Applied Research
Volume	185
Issue number	2
DOIs	https://doi.org/10.1002/1521-396X(200106)185:2<213::AID-PSSA213>3.0.CO;2-8
State	Published - Jun 2001

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@article{5e3831f03aca47539e1a625a5131d003,

title = "Elastic Properties of the Layered Zintl-Phase CaSi2",

abstract = "The elastic properdes of CaSi2 are studied by X-ray analysis of strained suicide films grown by reactive deposition epitaxy on Si(111), The diffraction linewidths are found to be mainly determined by heterogeneous strain with negligible size broadening. Homogeneous strain is induced by lattice mismatch for epitaxial films thinner than 50 nm, and is thermally induced for thicker films. The isotropic and anisotropic Poisson ratios of CaSi2 are determined as v = 0.123(7) and vc = 0.105(35), respectively.",

author = "G. Voog and Brandt, {M. S.} and M. Stutzmann",

year = "2001",

month = jun,

doi = "10.1002/1521-396X(200106)185:2<213::AID-PSSA213>3.0.CO;2-8",

language = "English",

volume = "185",

pages = "213--219",

journal = "Physica Status Solidi (A) Applied Research",

issn = "0031-8965",

publisher = "Wiley-VCH Verlag",

number = "2",

}

TY - JOUR

T1 - Elastic Properties of the Layered Zintl-Phase CaSi2

AU - Voog, G.

AU - Brandt, M. S.

AU - Stutzmann, M.

PY - 2001/6

Y1 - 2001/6

N2 - The elastic properdes of CaSi2 are studied by X-ray analysis of strained suicide films grown by reactive deposition epitaxy on Si(111), The diffraction linewidths are found to be mainly determined by heterogeneous strain with negligible size broadening. Homogeneous strain is induced by lattice mismatch for epitaxial films thinner than 50 nm, and is thermally induced for thicker films. The isotropic and anisotropic Poisson ratios of CaSi2 are determined as v = 0.123(7) and vc = 0.105(35), respectively.

AB - The elastic properdes of CaSi2 are studied by X-ray analysis of strained suicide films grown by reactive deposition epitaxy on Si(111), The diffraction linewidths are found to be mainly determined by heterogeneous strain with negligible size broadening. Homogeneous strain is induced by lattice mismatch for epitaxial films thinner than 50 nm, and is thermally induced for thicker films. The isotropic and anisotropic Poisson ratios of CaSi2 are determined as v = 0.123(7) and vc = 0.105(35), respectively.

UR - http://www.scopus.com/inward/record.url?scp=1842636862&partnerID=8YFLogxK

U2 - 10.1002/1521-396X(200106)185:2<213::AID-PSSA213>3.0.CO;2-8

DO - 10.1002/1521-396X(200106)185:2<213::AID-PSSA213>3.0.CO;2-8

M3 - Article

AN - SCOPUS:1842636862

SN - 0031-8965

VL - 185

SP - 213

EP - 219

JO - Physica Status Solidi (A) Applied Research

JF - Physica Status Solidi (A) Applied Research

IS - 2

ER -

Elastic Properties of the Layered Zintl-Phase CaSi₂

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