Abstract
In this Letter, the thermal stability of GaInAsSb grown by molecular-beam epitaxy was investigated. We found a strong blueshift for both bulk material and multiple-quantum-well (MQW) structures caused by thermal annealing. The shift is almost independent of design parameters such as indium concentration, strain, and growth parameters such as temperature. For a 500-nm -thick GaInAsSb bulk layer, a blueshift of 83 meV was found after annealing for 2 h at 520°C, whereas for MQW structures the maximum shift was 61 meV.
| Original language | English |
|---|---|
| Article number | 151120 |
| Pages (from-to) | 1-3 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 86 |
| Issue number | 15 |
| DOIs | |
| State | Published - 2005 |