Effects of thermal annealing on the band gap of GaInAsSb

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Abstract

In this Letter, the thermal stability of GaInAsSb grown by molecular-beam epitaxy was investigated. We found a strong blueshift for both bulk material and multiple-quantum-well (MQW) structures caused by thermal annealing. The shift is almost independent of design parameters such as indium concentration, strain, and growth parameters such as temperature. For a 500-nm -thick GaInAsSb bulk layer, a blueshift of 83 meV was found after annealing for 2 h at 520°C, whereas for MQW structures the maximum shift was 61 meV.

Original languageEnglish
Article number151120
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume86
Issue number15
DOIs
StatePublished - 2005

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