Effect of an atomically thin dielectric film on the surface electron dynamics: Image-potential states in the Ar/Cu (100) system

D. C. Marinica; C. Ramseyer; A. G. Borisov; D. Teillet-Billy; J. P. Gauyacq; W. Berthold; P. Feulner; U. Höfer

doi:10.1103/PhysRevLett.89.046802

Effect of an atomically thin dielectric film on the surface electron dynamics: Image-potential states in the Ar/Cu (100) system

D. C. Marinica
, C. Ramseyer
, A. G. Borisov
, D. Teillet-Billy
, J. P. Gauyacq
, W. Berthold
, P. Feulner
, U. Höfer

Chair of Experimental Physics

University Paris-Sud
Université de Franche-Comté
Philipps-Universität Marburg

Research output: Contribution to journal › Article › peer-review

64 Scopus citations

Abstract

A joint experimental-theoretical study of the effect of an atomically thin Ar layer on the image states on a Cu(100) surface was performed. The change of the image states was understood as the effect of a dielectric layer on the surface that repels the state wave function into vacuum. Scattering of the electron inside the Ar layer led to a non-free-wave character revealed by an effective mass different from the free electron mass for the electron motion parallel to the surface.

Original language	English
Article number	046802
Pages (from-to)	046802/1-046802/4
Journal	Physical Review Letters
Volume	89
Issue number	4
DOIs	https://doi.org/10.1103/PhysRevLett.89.046802
State	Published - 22 Jul 2002

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10.1103/PhysRevLett.89.046802

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Marinica, D. C., Ramseyer, C., Borisov, A. G., Teillet-Billy, D., Gauyacq, J. P., Berthold, W., Feulner, P., & Höfer, U. (2002). Effect of an atomically thin dielectric film on the surface electron dynamics: Image-potential states in the Ar/Cu (100) system. Physical Review Letters, 89(4), 046802/1-046802/4. Article 046802. https://doi.org/10.1103/PhysRevLett.89.046802

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AU - Borisov, A. G.

AU - Teillet-Billy, D.

AU - Gauyacq, J. P.

AU - Berthold, W.

AU - Feulner, P.

AU - Höfer, U.

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Effect of an atomically thin dielectric film on the surface electron dynamics: Image-potential states in the Ar/Cu (100) system

Abstract

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