DOPANT INCORPORATION AND DOPING EFFICIENCY IN a-Si:H AND a-Ge:H.

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

Abstract

Doping of hydrogenated amorphous silicon and germanium with boron, phosphorus, and arsenic is investigated. The incorporation of the dopants from the gas phase into the solid film is found to differ strongly for the various dopant-host systems. The doping efficiency is calculated from measurements of the density of dangling bond defects and of shallow band-tail states as a function of the doping level. A common square root dependence of the efficiency on dopant gas concentration is obtained.

Original languageEnglish
Title of host publicationMaterials Research Society Symposia Proceedings
PublisherMaterials Research Soc
Pages203-208
Number of pages6
ISBN (Print)0931837367, 9780931837364
DOIs
StatePublished - 1986
Externally publishedYes

Publication series

NameMaterials Research Society Symposia Proceedings
Volume70
ISSN (Print)0272-9172

Fingerprint

Dive into the research topics of 'DOPANT INCORPORATION AND DOPING EFFICIENCY IN a-Si:H AND a-Ge:H.'. Together they form a unique fingerprint.

Cite this