Direct in situ transmission electron microscopy observation of Al push up during early stages of the Al-induced layer exchange

B. I. Birajdar, T. Antesberger, B. Butz, M. Stutzmann, E. Spiecker

Research output: Contribution to journalArticlepeer-review

47 Scopus citations

Abstract

The mechanism of Al transport during Al-induced layer exchange and crystallization of amorphous Si (a-Si) has been investigated by in situ and analytical transmission electron microscopy. Significant grain boundary realignment and coarsening of Al grains close to the Si crystallization growth front as well as push up of excess Al into the a-Si layer at distances even a few micrometers away from the crystallization front were observed. Stress-mediated diffusion of Al is postulated to explain the experimental observations.

Original languageEnglish
Pages (from-to)550-553
Number of pages4
JournalScripta Materialia
Volume66
Issue number8
DOIs
StatePublished - Apr 2012

Keywords

  • Analytical electron microscopy
  • Crystallization
  • Diffusion
  • Solar cells
  • Thin films

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