Cyclotron resonance of localized electrons on a Si surface

J. P. Kotthaus, G. Abstreiter, J. F. Koch, R. Ranvaud

Research output: Contribution to journalArticlepeer-review

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Abstract

Cyclotron resonance of electrons in an inversion layer on a Si (100) surface is studied in the regime of low electron densities (ns<1012 electrons/cm2). A distinct and sample-dependent shift of the resonance to lower magnetic field is observed as ns is decreased and electron localization is expected to occur. We give a simple interpretation of the effect in terms of electronic states bound in a harmonic-oscillator potential.

Original languageEnglish
Pages (from-to)151-154
Number of pages4
JournalPhysical Review Letters
Volume34
Issue number3
DOIs
StatePublished - 1975

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