Abstract
Structure engineering is an emerging tool to control opto-electronic properties of semiconductors. Recently, control of crystal structure and the formation of a twinning superlattice have been shown for III-V nanowires. This level of control has not been obtained for Si nanowires, the most relevant material for the semiconductor industry. Here, we present an approach, in which a designed twinning superlattice with the zinc blende crystal structure or the wurtzite crystal structure is transferred from a gallium phosphide core wire to an epitaxially grown silicon shell. These materials have a difference in lattice constants of only 0.4%, which allows for structure transfer without introducing extra defects. The twinning superlattices, periodicity, and shell thickness can be tuned with great precision. Arrays of free-standing Si nanotubes are obtained by a selective wet-chemical etch of the core wire.
Original language | English |
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Pages (from-to) | 1690-1694 |
Number of pages | 5 |
Journal | Nano Letters |
Volume | 11 |
Issue number | 4 |
DOIs | |
State | Published - 13 Apr 2011 |
Keywords
- Nanowire
- epitaxy
- silicon
- structure transfer
- superlattice
- wurtzite