Confined plasmons in shallow etched quantum wires

R. Strenz, V. Rosskopf, F. Hirler, G. Abstreiter, G. Bohm, G. Trankle, G. Weimann

Research output: Contribution to journalArticlepeer-review

20 Scopus citations

Abstract

Resonant Raman scattering and FIR transmission spectroscopy is used to detect confined plasmons in shallow etched GaAs/AlGaAs single quantum well wires. Different samples with varying period lengths and wire widths are investigated. The lateral potential modulation can be estimated by analysing spatially direct and indirect luminescence. We find deviations from the simple model that uses a 2D plasmon dispersion relation and wavevectors corresponding to integral numbers of half wavelengths in the confined region.

Original languageEnglish
Article number011
Pages (from-to)399-403
Number of pages5
JournalSemiconductor Science and Technology
Volume9
Issue number4
DOIs
StatePublished - 1994

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