Combined atomic force microscope and electron-beam lithography used for the fabrication of variable-coupling quantum dots

M. C. Rogge; C. Fühner; U. F. Keyser; R. J. Haug; M. Bichler; G. Abstreiter; W. Wegscheider

doi:10.1063/1.1599972

Combined atomic force microscope and electron-beam lithography used for the fabrication of variable-coupling quantum dots

M. C. Rogge
, C. Fühner
, U. F. Keyser
, R. J. Haug
, M. Bichler
, G. Abstreiter
, W. Wegscheider

Natural Sciences

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

A study was performed on combined electron-beam lithography and atomic force microscopy used for the fabrication of variable-coupling quantum dots. The conventional electron-beam lithography was combined with direct nanofabrication by local anodic oxidation to produce a parallel double quantum dot based on a GaAs/AlGaAs heterostructure. It was found that the combination of both nanolithography methods allowed fabrication of robust in-plane gates.

Original language	English
Pages (from-to)	1163-1165
Number of pages	3
Journal	Applied Physics Letters
Volume	83
Issue number	6
DOIs	https://doi.org/10.1063/1.1599972
State	Published - 11 Aug 2003

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10.1063/1.1599972

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abstract = "A study was performed on combined electron-beam lithography and atomic force microscopy used for the fabrication of variable-coupling quantum dots. The conventional electron-beam lithography was combined with direct nanofabrication by local anodic oxidation to produce a parallel double quantum dot based on a GaAs/AlGaAs heterostructure. It was found that the combination of both nanolithography methods allowed fabrication of robust in-plane gates.",

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AU - Rogge, M. C.

AU - Fühner, C.

AU - Keyser, U. F.

AU - Haug, R. J.

AU - Bichler, M.

AU - Abstreiter, G.

AU - Wegscheider, W.

PY - 2003/8/11

Y1 - 2003/8/11

N2 - A study was performed on combined electron-beam lithography and atomic force microscopy used for the fabrication of variable-coupling quantum dots. The conventional electron-beam lithography was combined with direct nanofabrication by local anodic oxidation to produce a parallel double quantum dot based on a GaAs/AlGaAs heterostructure. It was found that the combination of both nanolithography methods allowed fabrication of robust in-plane gates.

AB - A study was performed on combined electron-beam lithography and atomic force microscopy used for the fabrication of variable-coupling quantum dots. The conventional electron-beam lithography was combined with direct nanofabrication by local anodic oxidation to produce a parallel double quantum dot based on a GaAs/AlGaAs heterostructure. It was found that the combination of both nanolithography methods allowed fabrication of robust in-plane gates.

UR - https://www.scopus.com/pages/publications/0041423518

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DO - 10.1063/1.1599972

M3 - Article

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SP - 1163

EP - 1165

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 6

ER -

Combined atomic force microscope and electron-beam lithography used for the fabrication of variable-coupling quantum dots

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