Combined atomic force microscope and electron-beam lithography used for the fabrication of variable-coupling quantum dots

M. C. Rogge; C. Fühner; U. F. Keyser; R. J. Haug; M. Bichler; G. Abstreiter; W. Wegscheider

doi:10.1063/1.1599972

Combined atomic force microscope and electron-beam lithography used for the fabrication of variable-coupling quantum dots

M. C. Rogge, C. Fühner, U. F. Keyser, R. J. Haug, M. Bichler, G. Abstreiter, W. Wegscheider

Natural Sciences

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Abstract

A study was performed on combined electron-beam lithography and atomic force microscopy used for the fabrication of variable-coupling quantum dots. The conventional electron-beam lithography was combined with direct nanofabrication by local anodic oxidation to produce a parallel double quantum dot based on a GaAs/AlGaAs heterostructure. It was found that the combination of both nanolithography methods allowed fabrication of robust in-plane gates.

Original language	English
Pages (from-to)	1163-1165
Number of pages	3
Journal	Applied Physics Letters
Volume	83
Issue number	6
DOIs	https://doi.org/10.1063/1.1599972
State	Published - 11 Aug 2003

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10.1063/1.1599972

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abstract = "A study was performed on combined electron-beam lithography and atomic force microscopy used for the fabrication of variable-coupling quantum dots. The conventional electron-beam lithography was combined with direct nanofabrication by local anodic oxidation to produce a parallel double quantum dot based on a GaAs/AlGaAs heterostructure. It was found that the combination of both nanolithography methods allowed fabrication of robust in-plane gates.",

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AU - Haug, R. J.

AU - Bichler, M.

AU - Abstreiter, G.

AU - Wegscheider, W.

PY - 2003/8/11

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Combined atomic force microscope and electron-beam lithography used for the fabrication of variable-coupling quantum dots

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