Characterization of analogue Monolithic Active Pixel Sensor test structures implemented in a 65 nm CMOS imaging process

Gianluca Aglieri Rinella, Giacomo Alocco, Matias Antonelli, Roberto Baccomi, Stefania Maria Beole, Mihail Bogdan Blidaru, Bent Benedikt Buttwill, Eric Buschmann, Paolo Camerini, Francesca Carnesecchi, Marielle Chartier, Yongjun Choi, Manuel Colocci, Giacomo Contin, Dominik Dannheim, Daniele De Gruttola, Manuel Del Rio Viera, Andrea Dubla, Antonello di Mauro, Maurice Calvin DonnerGregor Hieronymus Eberwein, Jan Egger, Laura Fabbietti, Finn Feindt, Kunal Gautam, Roman Gernhaeuser, James Julian Glover, Laura Gonella, Karl Gran Grodaas, Ingrid Maria Gregor, Hartmut Hillemanns, Lennart Huth, Armin Ilg, Artem Isakov, Daniel Matthew Jones, Antoine Junique, Jetnipit Kaewjai, Markus Keil, Jiyoung Kim, Alex Kluge, Chinorat Kobdaj, Artem Kotliarov, Kritsada Kittimanapun, Filip Křížek, Gabriela Kucharska, Svetlana Kushpil, Paola La Rocca, Natthawut Laojamnongwong, Lukas Lautner, Roy Crawford Lemmon, Corentin Lemoine, Long Li, Francesco Librizzi, Jian Liu, Anna Macchiolo, Magnus Mager, Davide Marras, Paolo Martinengo, Silvia Masciocchi, Serena Mattiazzo, Marius Wilm Menzel, Alice Mulliri, Alexander Musta, Mia Rose Mylne, Francesco Piro, Alexandre Rachevski, Marika Rasà, Karoliina Rebane, Felix Reidt, Riccardo Ricci, Sara Ruiz Daza, Gaspare Saccà, Isabella Sanna, Valerio Sarritzu, Judith Schlaadt, David Schledewitz, Gilda Scioli, Serhiy Senyukov, Adriana Simancas, Walter Snoeys, Simon Spannagel, Miljenko Šuljić, Alessandro Sturniolo, Nicolas Tiltmann, Antonio Trifirò, Gianluca Usai, Tomas Vanat, Jacob Bastiaan Van Beelen, Laszlo Varga, Michele Verdoglia, Gianpiero Vignola, Anna Villani, Haakan Wennloef, Jonathan Witte, Rebekka Bettina Wittwer

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Analogue test structures were fabricated using the Tower Partners Semiconductor Co. CMOS 65 nm ISC process. The purpose was to characterize and qualify this process and to optimize the sensor for the next generation of Monolithic Active Pixels Sensors for high-energy physics. The technology was explored in several variants which differed by: doping levels, pixel geometries and pixel pitches (10–25 μm). These variants have been tested following exposure to varying levels of irradiation up to 3 MGy and 1016 1 MeV neq cm−2. Here the results from prototypes that feature direct analogue output of a 4 × 4 pixel matrix are reported, allowing the systematic and detailed study of charge collection properties. Measurements were taken both using 55Fe X-ray sources and in beam tests using minimum ionizing particles. The results not only demonstrate the feasibility of using this technology for particle detection but also serve as a reference for future applications and optimizations.

Keywords

  • CMOS
  • MAPS
  • Particle detection
  • Silicon
  • Solid state detectors
  • Test beam

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