Atomic force microscope based nanomanipulator for mechanical and optical lithography

F. J. Rubio-Sierra, S. Burghardt, A. Kempe, W. M. Heckl, R. W. Stark

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

7 Scopus citations

Abstract

An atomic force microscope (AFM) based system has been built for the manipulation of materials at the nanometer scale. The AFM is combined with an inverse optical microscope and an UV-laser microbeam system for photoablation. The actuators of the AFM are controlled using a digital signal processor. Real-time routines and a graphical user interface have been programmed for high resolution imaging and nanomanipulation. The nanomanipulation can be pre-programmed off-line or directly performed using a low-cost haptic interface. In this paper we discuss the whole system and the different methods for manipulation.

Original languageEnglish
Title of host publication2004 4th IEEE Conference on Nanotechnology
Pages468-470
Number of pages3
StatePublished - 2004
Externally publishedYes
Event2004 4th IEEE Conference on Nanotechnology - Munich, Germany
Duration: 16 Aug 200419 Aug 2004

Publication series

Name2004 4th IEEE Conference on Nanotechnology

Conference

Conference2004 4th IEEE Conference on Nanotechnology
Country/TerritoryGermany
CityMunich
Period16/08/0419/08/04

Keywords

  • Actuators
  • Atomic force microscopy
  • Laser ablation
  • Lithography
  • Manipulators
  • Nanotechnology

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