Application of machine learning methods in post-silicon yield improvement

Baris Yigit, Grace Li Zhang, Bing Li, Yiyu Shi, Ulf Schlichtmann

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Scopus citations

Abstract

In nanometer scale manufacturing, process variations have a significant impact on circuit performance. To handle them, post-silicon clock tuning buffers can be included into the circuit to balance timing budgets of neighboring critical paths. The state of the art is a sampling-based approach, in which an integer linear programming (ILP) problem must be solved for every sample. The runtime complexity of this approach is the number of samples multiplied by the required time for an ILP solution. Existing work tries to reduce the number of samples but still leaves the problem of a long runtime unsolved. In this paper, we propose a machine learning approach to reduce the runtime by learning the positions and sizes of post-silicon tuning buffers. Experimental results demonstrate that we can predict buffer locations and sizes with a very good accuracy (90% and higher) and achieve a significant yield improvement (up to 18.8%) with a significant speed-up (up to almost 20 times) compared to existing work.

Original languageEnglish
Title of host publicationProceedings - 30th IEEE International System on Chip Conference, SOCC 2017
EditorsJurgen Becker, Ramalingam Sridhar, Hai Li, Ulf Schlichtmann, Massimo Alioto
PublisherIEEE Computer Society
Pages243-248
Number of pages6
ISBN (Electronic)9781538640333
DOIs
StatePublished - 18 Dec 2017
Event30th IEEE International System on Chip Conference, SOCC 2017 - Munich, Germany
Duration: 5 Sep 20178 Sep 2017

Publication series

NameInternational System on Chip Conference
Volume2017-September
ISSN (Print)2164-1676
ISSN (Electronic)2164-1706

Conference

Conference30th IEEE International System on Chip Conference, SOCC 2017
Country/TerritoryGermany
CityMunich
Period5/09/178/09/17

Keywords

  • Clock Skew
  • Machine Learning
  • Post-Silicon Tuning
  • Process Variations
  • Yield

Fingerprint

Dive into the research topics of 'Application of machine learning methods in post-silicon yield improvement'. Together they form a unique fingerprint.

Cite this