Abstract
The first aluminum nitride/diamond heterojunction light-emitting diode is realized by plasma-induced molecular beam epitaxy. The pn heterojunction consists of a silicon doped AlN (n-type) epitaxial film on (100) naturally boron-doped (p-type) diamond substrate. The diode shows excellent rectifying properties with intense light emission in the spectral range of approximately 2.7 and 4.8 eV. Heterojunctions manufactured from AlGaN alloys and diamond hold great promise for new applications in optoelectronics as well as in high frequency and high power electronics.
Original language | English |
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Pages (from-to) | 1873-1876 |
Number of pages | 4 |
Journal | Diamond and Related Materials |
Volume | 12 |
Issue number | 10-11 |
DOIs | |
State | Published - 2003 |
Keywords
- AlGaN alloys
- Plasma-induced molecular beam epitaxy (PIMBE)
- Pn Heterojunction