Advances in nanoimprint lithography

Paolo Lugli; Stefan Harrer; Sebastian Strobel; Francesca Brunetti; Giuseppe Scarpa; Marc Tornow; Gerhard Abstreiter

doi:10.1109/NANO.2007.4601394

Advances in nanoimprint lithography

Paolo Lugli, Stefan Harrer, Sebastian Strobel, Francesca Brunetti, Giuseppe Scarpa, Marc Tornow, Gerhard Abstreiter

Default

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

12 Scopus citations

Abstract

Challenges and issues of Nanoimprint Lithography (NIL) are addressed and discussed. In particular, imprinting properties of an innovative epoxy-based polymer have been investigated, which can be used for combined thermal and ultraviolet nanoimprinting (TUV-NIL) processes aiming at high-throughput nanoimprint lithography. Our recent progress in developing a new room-temperature nanoimprint (RTNIL) tool for the sub-10-nm region is shown.

Original language	English
Title of host publication	2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings
Pages	1179-1184
Number of pages	6
DOIs	https://doi.org/10.1109/NANO.2007.4601394
State	Published - 2007
Event	2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007 - Hong Kong, China Duration: 2 Aug 2007 → 5 Aug 2007

Publication series

Name	2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings

Conference

Conference	2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007
Country/Territory	China
City	Hong Kong
Period	2/08/07 → 5/08/07

Keywords

Isothermal imprint
Nanofabrication
Nanoimprint lithography
Room-temperature nanoimprint lithography

Access to Document

10.1109/NANO.2007.4601394

Cite this

Lugli, P., Harrer, S., Strobel, S., Brunetti, F., Scarpa, G., Tornow, M., & Abstreiter, G. (2007). Advances in nanoimprint lithography. In 2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings (pp. 1179-1184). Article 4601394 (2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings). https://doi.org/10.1109/NANO.2007.4601394

@inproceedings{62089e4bbb804ef08dcf41d71f18a622,

title = "Advances in nanoimprint lithography",

abstract = "Challenges and issues of Nanoimprint Lithography (NIL) are addressed and discussed. In particular, imprinting properties of an innovative epoxy-based polymer have been investigated, which can be used for combined thermal and ultraviolet nanoimprinting (TUV-NIL) processes aiming at high-throughput nanoimprint lithography. Our recent progress in developing a new room-temperature nanoimprint (RTNIL) tool for the sub-10-nm region is shown.",

keywords = "Isothermal imprint, Nanofabrication, Nanoimprint lithography, Room-temperature nanoimprint lithography",

author = "Paolo Lugli and Stefan Harrer and Sebastian Strobel and Francesca Brunetti and Giuseppe Scarpa and Marc Tornow and Gerhard Abstreiter",

year = "2007",

doi = "10.1109/NANO.2007.4601394",

language = "English",

isbn = "1424406080",

series = "2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings",

pages = "1179--1184",

booktitle = "2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings",

note = "2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007 ; Conference date: 02-08-2007 Through 05-08-2007",

}

Lugli, P, Harrer, S, Strobel, S, Brunetti, F, Scarpa, G , Tornow, M & Abstreiter, G 2007, Advances in nanoimprint lithography. in 2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings., 4601394, 2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings, pp. 1179-1184, 2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Hong Kong, China, 2/08/07. https://doi.org/10.1109/NANO.2007.4601394

Advances in nanoimprint lithography. / Lugli, Paolo; Harrer, Stefan; Strobel, Sebastian et al.
2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings. 2007. p. 1179-1184 4601394 (2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Advances in nanoimprint lithography

AU - Lugli, Paolo

AU - Harrer, Stefan

AU - Strobel, Sebastian

AU - Brunetti, Francesca

AU - Scarpa, Giuseppe

AU - Tornow, Marc

AU - Abstreiter, Gerhard

PY - 2007

Y1 - 2007

N2 - Challenges and issues of Nanoimprint Lithography (NIL) are addressed and discussed. In particular, imprinting properties of an innovative epoxy-based polymer have been investigated, which can be used for combined thermal and ultraviolet nanoimprinting (TUV-NIL) processes aiming at high-throughput nanoimprint lithography. Our recent progress in developing a new room-temperature nanoimprint (RTNIL) tool for the sub-10-nm region is shown.

AB - Challenges and issues of Nanoimprint Lithography (NIL) are addressed and discussed. In particular, imprinting properties of an innovative epoxy-based polymer have been investigated, which can be used for combined thermal and ultraviolet nanoimprinting (TUV-NIL) processes aiming at high-throughput nanoimprint lithography. Our recent progress in developing a new room-temperature nanoimprint (RTNIL) tool for the sub-10-nm region is shown.

KW - Isothermal imprint

KW - Nanofabrication

KW - Nanoimprint lithography

KW - Room-temperature nanoimprint lithography

UR - http://www.scopus.com/inward/record.url?scp=52949154341&partnerID=8YFLogxK

U2 - 10.1109/NANO.2007.4601394

DO - 10.1109/NANO.2007.4601394

M3 - Conference contribution

AN - SCOPUS:52949154341

SN - 1424406080

SN - 9781424406081

T3 - 2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings

SP - 1179

EP - 1184

BT - 2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings

T2 - 2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007

Y2 - 2 August 2007 through 5 August 2007

ER -

Advances in nanoimprint lithography

Abstract

Publication series

Conference

Keywords

Access to Document

Other files and links

Fingerprint

Cite this