@inproceedings{20ba9e64108344f384d0fab2c988ef20,
title = "Active shape control of transmissive optical elements",
abstract = "Photolithography equipment manufacturers are continuously developing machines with ever increasing resolution and wafer throughput. The development has shown that previously less dominant performance limiting factors are increasingly impacting the conformity between the projected image and the object plane. It is envisaged that active optical elements are required for the correction of these non-conformities. This paper introduces the concept of active transmissive optical element shape control to improve focus whilst minimizing the effect of stress-birefringence and overlay.",
author = "Valentin, {C. L.} and Vermeulen, {J. P.M.} and T. Cadee and Rixen, {D. J.} and Schmidt, {R. H.Munnig}",
note = "Publisher Copyright: {\textcopyright} euspen Headquarters.; 9th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2009 ; Conference date: 02-06-2009 Through 05-06-2009",
year = "2009",
language = "English",
series = "Proceedings of the 9th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2009",
publisher = "euspen",
pages = "126--129",
editor = "{Van Brussel}, Hendrik and Theresa Burke and H. Spaan and E. Brinksmeier and Theresa Burke and Theresa Burke",
booktitle = "Proceedings of the 9th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2009",
}