A new type of low-κ dielectric films based on polysilsesquioxanes

R. Q. Su; T. E. Müller; J. Procházka; J. A. Lercher

doi:10.1002/1521-4095(20021002)14:19<1369::AID-ADMA1369>3.0.CO;2-I

A new type of low-κ dielectric films based on polysilsesquioxanes

R. Q. Su, T. E. Müller, J. Procházka, J. A. Lercher

Chair of Chemical Technology II

Technical University of Munich

Research output: Contribution to journal › Article › peer-review

93 Scopus citations

Abstract

A new type of organic-inorganic hybrid copolymer with low dielectric constant κ was synthesized by i) platinum catalyzed hydrosilylation of H₈Si₈O₁₂, T₈^H and (HSiMe₂O)₈Si₈O₁₂, Q₈M₈^H with hexadiene or ii) hydrolytic condensation of [(EtO)₃Si(CH₂)₂]₈- Si₈O₁₂, T₈^R and [(EtO)₃Si(CH₂)₂SiMe₂O]₈- Si₈O₁₂, Q₈M₈^R with water. Copolymer films were fabricated by spin-coating techniques. Dielectric constant measurements showed that the new copolymers have a relatively low κ (2.1-2.7) compared to the reference data. Properties such as film adhesion and hardness were found to be closely correlated with the length of cross linker. Scanning electron microscopy (SEM) revealed that all copolymer films are planar and flat.

Original language	English
Pages (from-to)	1369-1373
Number of pages	5
Journal	Advanced Materials
Volume	14
Issue number	19
DOIs	https://doi.org/10.1002/1521-4095(20021002)14:19<1369::AID-ADMA1369>3.0.CO;2-I
State	Published - 2 Oct 2002

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title = "A new type of low-κ dielectric films based on polysilsesquioxanes",

abstract = "A new type of organic-inorganic hybrid copolymer with low dielectric constant κ was synthesized by i) platinum catalyzed hydrosilylation of H8Si8O12, T8H and (HSiMe2O)8Si8O12, Q8M8H with hexadiene or ii) hydrolytic condensation of [(EtO)3Si(CH2)2]8- Si8O12, T8R and [(EtO)3Si(CH2)2SiMe2O]8- Si8O12, Q8M8R with water. Copolymer films were fabricated by spin-coating techniques. Dielectric constant measurements showed that the new copolymers have a relatively low κ (2.1-2.7) compared to the reference data. Properties such as film adhesion and hardness were found to be closely correlated with the length of cross linker. Scanning electron microscopy (SEM) revealed that all copolymer films are planar and flat.",

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N2 - A new type of organic-inorganic hybrid copolymer with low dielectric constant κ was synthesized by i) platinum catalyzed hydrosilylation of H8Si8O12, T8H and (HSiMe2O)8Si8O12, Q8M8H with hexadiene or ii) hydrolytic condensation of [(EtO)3Si(CH2)2]8- Si8O12, T8R and [(EtO)3Si(CH2)2SiMe2O]8- Si8O12, Q8M8R with water. Copolymer films were fabricated by spin-coating techniques. Dielectric constant measurements showed that the new copolymers have a relatively low κ (2.1-2.7) compared to the reference data. Properties such as film adhesion and hardness were found to be closely correlated with the length of cross linker. Scanning electron microscopy (SEM) revealed that all copolymer films are planar and flat.

AB - A new type of organic-inorganic hybrid copolymer with low dielectric constant κ was synthesized by i) platinum catalyzed hydrosilylation of H8Si8O12, T8H and (HSiMe2O)8Si8O12, Q8M8H with hexadiene or ii) hydrolytic condensation of [(EtO)3Si(CH2)2]8- Si8O12, T8R and [(EtO)3Si(CH2)2SiMe2O]8- Si8O12, Q8M8R with water. Copolymer films were fabricated by spin-coating techniques. Dielectric constant measurements showed that the new copolymers have a relatively low κ (2.1-2.7) compared to the reference data. Properties such as film adhesion and hardness were found to be closely correlated with the length of cross linker. Scanning electron microscopy (SEM) revealed that all copolymer films are planar and flat.

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A new type of low-κ dielectric films based on polysilsesquioxanes

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